Gauss Labs and SK hynix Unveil Groundbreaking AI Semiconductor Metrology Findings

SK hynix and Gauss Labs present AI-based metrology technology at SPIE AL 2024 conference, showcasing improvements in semiconductor yield, process variability, and throughput.

Significant improvement in prediction accuracy of AI-based virtual metrology solution
Efficient utilization of resources through pooled processing machines and chambers
Revolutionizing semiconductor manufacturing through industrial AI applications

SK hynix Inc. and Gauss Labs recently made an exciting announcement at the SPIE AL 2024 conference in SAN Jose, California. The two companies presented two groundbreaking papers on the latest AI-based metrology technology. This collaboration between SK hynix and Gauss Labs aims to enhance semiconductor yield and productivity, and the results are truly remarkable.

One of the papers, titled “Model Aggregation for Virtual Metrology for High-Volume Manufacturing,” introduces Gauss Labs’ “aggregated AOM” algorithm. This algorithm significantly improves the prediction accuracy of their AI-based virtual metrology solution, Panoptes VM. SK hynix has been utilizing Panoptes VM since December 2022, conducting virtual measurements on over 50 million wafers, equivalent to more than one wafer per second. Thanks to this technology, SK hynix has successfully improved process variability by an impressive 29%.

The aggregated AOM algorithm developed by Gauss Labs tackles the challenge of data shortage by pooling processing machines and chambers that share the same pattern and models them together. This approach not only increases prediction accuracy but also ensures efficient utilization of resources. Gauss Labs’ innovation is truly commendable as it solves a critical problem in the field of metrology.

In their second paper, titled “Universal Denoiser to Improve Metrology Throughput,” Gauss Labs introduces another groundbreaking technology. This “universal denoiser” effectively removes random variations or noise from CD-SEM images. CD-SEM image measurements are taken at a nanometer scale, making noise removal crucial for accurate measurements. Gauss Labs’ universal denoiser utilizes AI to remove noise from various types of images simultaneously. Through extensive testing with SK hynix, Gauss Labs achieved a significant reduction in image acquisition time compared to conventional technology, up to ¼ of the original time. This breakthrough is expected to enhance the productivity of metrology equipment by an impressive 42%.

Mike Kim, CEO of Gauss Labs, expressed his company’s commitment to revolutionizing semiconductor manufacturing through industrial AI applications. Gauss Labs will continue to develop innovative AI-based solutions to drive the industry forward.

These two papers presented at the SPIE AL 2024 conference highlight the exciting advancements made by SK hynix and Gauss Labs in the field of AI-based metrology. Their collaboration has yielded remarkable results, improving semiconductor yield, process variability, and metrology throughput. The future of semiconductor manufacturing looks promising as these innovative technologies continue to push boundaries and revolutionize the industry.

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Background Information

About SK hynix: SK Hynix is a prominent South Korean semiconductor company known for its innovative contributions to the global technology landscape. Specializing in the production of memory solutions, SK Hynix has played a vital role in shaping the semiconductor industry. With a commitment to research and development, they have continuously pushed the boundaries of memory technology, resulting in cutting-edge products that power various devices and applications.

Technology Explained

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